Domestic FDC products in semiconductors are rising, GETECH actively practices technological innovation
From April 17-19, 2023, the 25th China Integrated Circuit Manufacturing Annual Conference (CICD) and Supply Chain Innovation Development Conference were grandly held in Guangzhou. GETECH was invited to appear, and Chief Architect Wu Wenlong of the Semiconductor Business Unit delivered a keynote speech titled "Domestic FDC Products Are Rising in the Semiconductor Industry".
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Equipment data as assets
FDC releases equipment data value
FDC equipment anomaly detection and classification system is essential in semiconductor smart manufacturing. As a core system for 8-inch/12-inch and advanced packaging plants, it analyzes equipment data in real-time for fault detection and control.
"A semiconductor factory has over 100 types of process equipment, more than 1,000 key devices, generating billions of equipment data daily. Massive, high-frequency data is a valuable asset. Analyzing and mining this data enhances intelligent equipment management, process optimization, and yield improvement. FDC falls into smart equipment management, highlighting its importance," Wu Wenlong stated.
Calculations show FDC system application brings significant benefits: improves OEE by 5.8% through timely fault detection and process stability, reduces test and waste slices, cuts production costs by an estimated 38 million, and enhances personnel efficiency by upgrading from manual to automatic detection.
For broad semiconductor applications, GETECH FDC offers excellent new architecture performance, ease of use, and convenient运维. Its big data architecture突破 traditional system bottlenecks, supports high-throughput, low-latency real-time computing, with fast response and analysis. For example, in real-time performance, GETECH FDC controls data link delay within 500ms for about 83.61%, within 1s for 97%; speed is 6-10 times faster than traditional FDC.
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GETECH actively explores FDC product tech innovation
Traditional FDC relies on static statistical analysis, with bottlenecks. Model building depends on engineer experience, challenging for new plants or processes. It manages hundreds of thousands of single-factor detection models, static and unable to感知 process changes, only monitoring real-time data with low historical data utilization, wasting data assets.
Based on expanding industrial scenarios and diverse needs, GETECH explores FDC innovation. "FDC trends include: product form moving from production to cloud and device端;技术上, with AI, from traditional SPC to industrial AI diagnosis and prediction; product platformization:重构 CIM system, from单一 industrial software to equipment management center," Wu Wenlong shared.
For these trends, GETECH actively innovates in cloud-edge协同 industrial internet architecture, EdgeFDC, closed-loop management from fault detection to repair, AI FDC.
For example, in dry etching, past engineers built FDC virtual models based on experience for anomaly interception via circuit monitoring, with low efficiency, still causing产能 impact or批量 damage. After applying AI FDC, GETECH enhanced multi-factor analysis, discovered key factors like temperature and conductivity, and improved interception efficiency through site-focused analysis.
In conclusion, Wu Wenlong said: "Future industrial software must break original boundaries, start from customer business processes and pain points to find new directions. GETECH will continue combining tech innovation with production scenes, enhancing product, organizational, sales, and delivery capabilities for more autonomous semiconductor factories in China."
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